Bubble Point Pressure of the Solutions of H2SiF6 + H2O and H2SiF6 + CO(NH2)2 + H2O from 323 K to 353 K Hou, C.H.; Wang, G.L.; Zhang, B.L.; Journal of Chemical & Engineering Data 2006, 51, 864-866
- Journal: Journal of Chemical & Engineering Data
- Sample Quantity(ies): Vapor pressure
- Methodology: CCELL:UFactor:8
- Phase(s): Liquid
- Substances:
Data
| T (K) | P (kPa) |
| 323 | 11.84 |
| 328 | 15.03 |
| 333 | 19.01 |
| 338 | 23.79 |
| 343 | 29.9 |
| 348 | 37.34 |
| 353 | 46.11 |
377; urea + water; 00004:00169