Bubble Point Pressure of the Solutions of H2SiF6 + H2O and H2SiF6 + CO(NH2)2 + H2O from 323 K to 353 K Hou, C.H.; Wang, G.L.; Zhang, B.L.; Journal of Chemical & Engineering Data 2006, 51, 864-866
- Journal: Journal of Chemical & Engineering Data
- Sample Quantity(ies): Vapor pressure
- Methodology: CCELL:UFactor:8
- Phase(s): Liquid
- Substances:
Data
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18629; urea + water + hexafluorosilic acid; 00004:00169:03321