Hexafluorosilicate Salts in Wet Phosphoric Acid Processes: Properties of X2SiF6-H2O with X = Na + , K + , or NH4 + in Aqueous Solutions at 353.15 K El Guendouzi, M.; Skafi, M.; Rifai, A.; Journal of Chemical & Engineering Data 2016, 61, 1728-1734
Data
T = 353.15 K, P = 100 kPa
m (mol kg-1) γi (mol dm3 mol-1 dm-3)
0.05 0.9979
0.14 0.994
0.15 0.9935
0.16 0.9931
0.17 0.9926
0.18 0.9921
0.19 0.9916
0.20 0.9911
0.21 0.9905
0.22 0.99
0.25 0.9883
0.06 0.9974
0.07 0.997
0.08 0.9966
0.09 0.9962
0.10 0.9958
0.11 0.9953
0.12 0.9949
0.13 0.9945
988; water + sodium hexafluorosilicate; 00004:00351